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Structure and ionic conductivity of reactively sputtered apatite-type lanthanum silicate thin films

2014-05Artigo científico Acesso restrito
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datacite.subject.sdg03:Saúde de Qualidade
datacite.subject.sdg07:Energias Renováveis e Acessíveis
datacite.subject.sdg11:Cidades e Comunidades Sustentáveis
dc.contributor.authorM.M. Vieira
dc.contributor.authorOliveira, J. C.
dc.contributor.authorShaula, A. L.
dc.contributor.authorTrindade, B.
dc.contributor.authorCavaleiro, A.
dc.date.accessioned2026-06-16T13:25:14Z
dc.date.available2026-06-16T13:25:14Z
dc.date.issued2014-05
dc.description.abstractLa–Si–O thin films with Si/(La + Si) atomic ratios ranging from 0.36 to 0.43 were produced by magnetron sputtering in a reactive Ar/O discharge gas. The as-deposited films have large X-ray diffraction peak characteristic of quasi-amorphousmaterials and oxygen contents from29 to 35 at.%. The Apatite-type lanthanumsilicate phase was formed in all the as-deposited films upon annealing at 900 °C for 1 h. The lanthanumsilicate films obtained by annealing the as-deposited filmswith lower Si/(La+Si) atomic ratios have a preferential orientationwith the c-axis perpendicular to the substrate while low intensity diffraction peaks ascribed to La2Si2O7 phase were detected in the films deposited with higher Si content. The preferentially oriented films have higher activation energy and lower ionic conductivity as the ionic conductivity measurements were performed in the direction perpendicular to the c-axis. The highest ionic conductivity was obtained for the film deposited with a Si/(La + Si) atomic ratio of 0.42, with a value of 1.2 × 10−2 S·cm−1 at 750 °C.eng
dc.description.sponsorshipThis research is sponsored by FEDER funds through the program COMPETE – Programa Operacional Factores de Competitividade – and by national funds through FCT – Fundação para a Ciência e a Tecnologia – under the projects PEst-C/EME/UI0285/2013 and PTDC/CTM-CER/118933/2010, respectively
dc.identifier.citationM.M. Vieira, J.C. Oliveira, A.L. Shaula, B. Trindade, A. Cavaleiro, Structure and ionic conductivity of reactively sputtered apatite-type lanthanum silicate thin films, Surface and Coatings Technology, Volume 247, 2014, Pages 14-19, ISSN 0257-8972, https://doi.org/10.1016/j.surfcoat.2014.02.064
dc.identifier.doi10.1016/j.surfcoat.2014.02.064
dc.identifier.issn0257-8972
dc.identifier.urihttp://hdl.handle.net/10400.8/16422
dc.language.isoeng
dc.peerreviewedyes
dc.publisherElsevier BV
dc.relationStrategic Project - UI 285 - 2013-2014
dc.relation.hasversionhttps://www.sciencedirect.com/science/article/pii/S0257897214001947
dc.relation.ispartofSurface and Coatings Technology
dc.rights.uriN/A
dc.subjectLanthanum silicate
dc.subjectApatite-type
dc.subjectThin films
dc.subjectSOFC
dc.subjectIonic conductivity
dc.titleStructure and ionic conductivity of reactively sputtered apatite-type lanthanum silicate thin filmseng
dc.typejournal article
dspace.entity.typePublication
oaire.awardNumberPEst-C/EME/UI0285/2013
oaire.awardTitleStrategic Project - UI 285 - 2013-2014
oaire.awardURIhttp://hdl.handle.net/10400.8/13285
oaire.citation.endPage19
oaire.citation.startPage14
oaire.citation.titleSurface & Coatings Technology
oaire.citation.volume247
oaire.fundingStream6820 - DCRRNI ID
oaire.versionhttp://purl.org/coar/version/c_970fb48d4fbd8a85
person.familyNameVieira
person.givenNameMilena
person.identifier.ciencia-id3518-08C5-CBC6
person.identifier.orcid0000-0002-2376-6557
relation.isAuthorOfPublication4e74fc39-24c3-4d97-b469-a82552bdc795
relation.isAuthorOfPublication.latestForDiscovery4e74fc39-24c3-4d97-b469-a82552bdc795
relation.isProjectOfPublication6b741f11-7fd6-4328-8dbb-0eff4bc07dc1
relation.isProjectOfPublication.latestForDiscovery6b741f11-7fd6-4328-8dbb-0eff4bc07dc1

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